This paper presents a method for the optimization of the bionic functi on of thin films to implement fly-eye structures by direct four-beam interference lithography.Apa rt from the main approaches made in the field of semiconductor materials,the method provides a n ew application area of laser interference lithography.For multilayer composite films,the results of l aser interference lithography are related to the transmittance of films,and within a certain range of laser f luences,the transmittance affects the formation of lithographic patterns.In the experiment,the laser wav elength is 1064nm and the incident angle of beams is 5°.The different lithographic patterns on the thin films with the light transmittance values of 5%,30% and 75% are obtained using different laser fluences ranging from 20mJ to 30mJ,and the best contrast image is achieved when the laser flue nce is 25mJ.The experimental results are in accordance with the theoretical analysis and simulat io n.The reflectances of the films with the light transmittance values of 5%,30% and 75% are also measured over the wave band of 700－1200nm using the Perkin Elmer lambda950spectrophotomet er with an integra ting sphere.The measurement results have shown that the antireflection propertie s can be achieved on the film surface.