Nb/Nd共掺Bi4Ti3O12对ZnO基薄膜晶体管性能的影响
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龚跃球(1974-),男,博士,副教授,主要从 事光电子信息材料与器件方面的研究.

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国家自然科学基金(11372268)资助项目 (湘潭大学 材料与光电物理学院,湖南 湘潭 411105)


Effects of Nb/Nd codoped Bi4Ti3O12 on the performanace of ZnO-based t hin film transistors
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    摘要:

    利用化学溶液沉积(CSD)法,在Pt/Ti/SiO2/Si(100)衬底上成功制备以B3.15Nd0.85Ti 3-xNb xO12(BNTNx, x=0.01,0.03,0.05,0.07)薄膜作为栅介质层、以ZnO 薄膜作为有源层的铁电薄膜晶体管(ZnO/BNTN铁电 TFT)。研究了Nb含量对BNTN薄膜微结构、介电和铁电性能的影响。结果表明,BNTN0.03薄膜的剩余极 化(2Pr)最大(71.4μC/cm2),介电 常数最大(370)。测得BNTNx薄膜的居里 温度约为410℃,介电损耗(tanδ) 约为0.02。ZnO/BNTN铁电TFT相比ZnO/SiO2层TFT,有较好的输出特 性和转移特性,其阈值电压、沟 道迁移率、存储窗口和开关电流比分别达到了2.5V、5.68cm2/Vs、1.5V和1.8×105

    Abstract:

    ZnO-based thin film transistors (ZnO -TFTs) were fabricated with Nb/Nd codoped Bi4Ti3O12 ferroeledctric thin film as gate dielectric layer.The B3.15Nd0.85Ti 3-xNbxO12 (BNTN x,x=0.01,0.03,5,0.07) thin film was prepared on Pt/Ti/SiO2/Si(100) substrate by chemical solution deposit ion method.The effects of Nb content on micro-structure,dielectric property and ferroelectricity of BNTNx f ilms have been studied.The BNTN0.03 film has the largest remanent polarization and dielectric constan t,which are 71.4μC/cm2and 370, respectively.The measured Curie temperature of BNTNx f ilms is about 410℃ and the dielectric loss is around 0.02.ZnO/BNTN ferroelectric TFT,compared with ZnO/SiO2TFT,has superior outpu t characteristic and transfer characteristic.The values of threshold voltage,cha nnel mobility,memory window and current on/off ratio are 2.5V,5.68cm2/Vs,1.5V and 1.8×105,respectively.

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龚跃球,刘奕帆,阳歌,谢淑红. Nb/Nd共掺Bi4Ti3O12对ZnO基薄膜晶体管性能的影响[J].光电子激光,2014,(7):1242~1247

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  • 收稿日期:2014-01-21
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