Cd掺杂ZnO薄膜的光致发光性能研究
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郑必举(1982-),男,山西大同人,博士,讲 师,主要从事透明导电氧化薄膜的制备及其光电性能研究.

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云南省科技厅(KKSY201251089)资助项目 , 胡文 (昆明理工大学 材料科学与工程学院,云南 昆明 650093)


Study on photoluminescence properties of Cd-doped ZnO thin films
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    摘要:

    三元半导体Cd掺杂ZnO薄膜通过脉冲激光法沉积 在石英玻璃基底上,Gd含量x从0增加到0.23。X射线衍射(XRD)图谱表明,所有Zn1-xCd xO薄膜都具有c轴取向的六方纤锌矿结构,而且c轴 晶格常数随着 x的增加而增加。原子力显微镜(AFM)观察到,随着x的增加,Zn1-xCdxO 薄膜的晶粒尺寸逐渐减小。光致发光(PL)和透过率 测量都证实,随着x的增加,薄膜的禁带宽度Eg从3.27eV降低到了2.78eV,同时导致了PL峰半高 宽(FWHM)的变大。PL峰迁移到了可见光范围内,使得Zn1-xCdxO薄膜可以应用在可见光发光二极管及其它高效率的光电 子器件。

    Abstract:

    Ternary polycrystalline Cd-doped ZnO semiconductor thin films with cad mium content (x) ranging from 0to 0.23were obtained on quartz substrate by pulse laser deposite d (PLD) technique. X-ray diffraction (XRD) measurement reveals that all the films are single pha se of wurtzite structure grown on c-axis orientation with its c-axis lattice constant increasing as the Cd content x increasing.The increase of lattice constant is due to the fact that the covalen t radius of Cd2+ is larger than that of Zn2+,and therefore the substitution of Zn2+ ions by Cd2+ ions induces a lattice volume expansion.Atomic force microscopy (AFM) observatio n reveals that the grain size of Zn1-xCdxO films decreases continuously as the Cd content x increases.Bo th photoluminescence(PL) and optical measurements show that the band gap de creases from 3.27eV to 2.78eV with increasing the Cd content x,which can be interpreted in terms of band gap modul ation due to Cd doping.Increasing the Cd content x also leads to the bro adening of the emission peak.The broadening and other small peaks result from various crystalline defects.The shift o f PL emission to visible light range makes the Zn1-xCdxO films to be potential candidate for optoelectronic devices.

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郑必举,胡文. Cd掺杂ZnO薄膜的光致发光性能研究[J].光电子激光,2013,(10):1942~1947

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  • 收稿日期:2013-03-10
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