Natively textured surface Al-doped ZnO(ZnO:Al) thin films with crater-like structure were directly deposited via reactive magnetron sputtering.The optical transmittance and haze performance of ZnO:Al thin films with low sheet resistances are improved through(GOG,gradual oxygen growth) method.The crater-like feature sizes of ZnO:Al thin films(structure:11.0 sccm/10R+9.5 sccm/15R) with gradual oxygen growth are ~300-500 nm.Typical optical and electrical characteristics of ZnO:Al thin films are:transmittance in visible region is ~90%,sheet resistance is ~4.0 Ω and electron mobility is ~17.4 cm2/Vs.Large-area(S=110 mm×240 mm) ZnO:Al thin film exhibits milky surface and good electrical uniformity.Natively textured surface ZnO:Al thin films are promising TCO materials for PV industry.