In this paper,the high rate deposition of microcrystalline silicon thin films is achieved by very high frequency plasma enhanced chemical vapor deposition(VHF-PECVD) working at high pressure and high power(HPHP).The best deposition parameters are determined.Under these deposition parameters,the HPHP films show better optical and electrical properties.The deposition rate,photo-conductivity,dark conductivity and photo-sensitivity are tested.The results show that the way of depositing microcrystall...