Diamond films with {110} texture were deposited on (100) p-Si substrate under 5 000 W by microwave plasma CVD,annealing process was adopted to adjust residual stress in film.Key findings through Raman spectroscopy and high angle X-ray line shape show that the intrinsic tensile stress in all specimens is very small due to the increase of the order of grain distribution.Also,it can be found that residual stress exhibits compressive,smiliar with the state of its thermal stress.Further,Absolute value of residua...