2D-period patterned Si substrate is annealed in ultra-high vacuum chemical vapor deposition(UHV/CVD)under variational conditions including different temperature,environment,thermal decomposition of native silicon oxide.The morphology properties of annealed patterned-substrate are obtained by atomic force microscopy(AFM).The effect of annealing parameters on shape transformation of Si patterned-substrate is studied.The results indicate that the Si atoms can diffuse freely on substrate surface in vacuum and t...