Amorphous carbon films were deposited on single crystalline silicon and K9 glass by pulse laser with different negative substrate dc biasing.Scanning electron microscope was used to observe morphology of surface.Thickness and refractive index was measured by ellipsometry for the fillm deposited on K9 glass.Microhardness were measured relative to crystal silicon.Raman spectra were carried on for all films deposited on silicon,all spectra were decinvoluted to three peaks Line width ratios varied similarly with bias voltage while the laser energy is same.Ane the hardness of the film also varied with the different bias voltage.