| 张腾,胡诚,谭兴毅,朱永丹.射频磁控溅射法制备GZO:Ti薄膜的微结构及其光学性质[J].光电子激光,2017,28(11):1218~1223 |
| 射频磁控溅射法制备GZO:Ti薄膜的微结构及其光学性质 |
| Microstructure and optical properties of GZO:Ti thin films prepared by RF magnet ron sputtering |
| 投稿时间：2017-03-04 |
| DOI： |
| 中文关键词: 镓钛共掺杂氧化锌(GZO:Ti)薄膜 磁控溅射 微结构 光学性质 |
| 英文关键词:gallium and titanium co-doped zinc oxide (GZO:Ti) thin film magnetron sputteri ng microstructure optical properties |
| 基金项目:国家自然科学基金(11504101,11364018)资助项目 (1.湖北民族学院 理学院,湖北 恩施 445000； 2.湖北民族学院 信息工程学院,湖北 恩施 445000) |
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| 中文摘要: |
| 采用射频(RF)磁控溅射工艺于玻璃衬底沉积了镓钛 共掺杂氧化锌(GZO:Ti)半导体薄膜,研究了沉积 温度对薄膜微观结构和光学性质的影响。通过X射线衍射仪(XRD)和紫外分光光度计对其晶体 结构和透射光谱特 性进行表征,同时利用光谱拟合法获取了薄膜的光学常数。研究结果表明,所有薄膜均具备 六角纤锌矿结 构和c轴择优取向特性,沉积温度对薄膜的微结构参数、光学 常数和光学带隙具有明显调控作用,当沉积 温度为653K时,GZO:Ti薄膜的晶粒尺寸最大(82.12nm)、位错密度最低(1.48×10－4 nm－2) 、微应变最小(0.001)、可见光区平均透射 率 最高(82.06%)及光学带隙值最大(3.57eV )。 |
| 英文摘要: |
| Gallium and titanium co-doped zinc oxide (GZO:Ti) thin films were dep osited on glass substrates by radio-frequency (RF) magnetron sputtering.The effect of depositing temperature on microstructure and optical properties of the thin films is investigated.The crystal structure and transmi ttance spectrum of the thin films are characterized by X-ray diffraction and UV-visible spectrophotometer,resp ectively.The optical constants of the thin films are obtained by spectrum fitting method.The results indicate th at all the deposited thin films possess hexagonal wurtzite structure with a strong growth orientation along the (002) c-axis.The deposition temperature plays an obviously regulative role on the microstructural parameters ,optical constants and optical band gap.The film deposited at temperature of 653K exhibits the largest crystallite size of 82.12nm,the lowest dislocation density of 1.48×10－4 nm－2,the lowest micro-strain of 0.0014,the highest average visible transmittance of 82.06% and the maximum optical band gap of 3.57eV. |
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